VICTORY Process is a general purpose 3D process simulator. VICTORY Process includes a complete process flow core simulator and three advanced simulation modules: Monte Carlo Implant, Advanced Diffusion and Oxidation, and Physical Etch and Deposit. Proprietary models, as well as public domain research models, can be easily integrated into VICTORY Process using the open modeling interface.
The Interactive Tools are a suite of applications that provide interactive GUI-based pre and post processing services to Silvaco’s 1D, 2D and 3D TCAD simulators. The tools within the interactive tools suite are fully integrated and provide users with a comfortable environment within which all TCAD simulations can be performed.
Key Features
Sophisticated multi-particle flux models for physical deposition and etching with substrate material redeposition
Extremely accurate and fast Monte Carlo implant simulation
Comprehensive set of 3D diffusion models: Fermi, three-stream, and five-stream
3D physical oxidation simulation with stress analysis
Fast 3D structure prototyping capability enables the in-depth physical analysis of specific processing issues
Accurately predicts 3D topology and 3D dopant distribution
Automatic meshing and Adaptive Mesh Refinement
Efficient multi-threading of time critical operations of Monte Carlo implantation, diffusion, oxidation, and physical etching and deposition
Open architecture allows easy introduction and modification of customer specific physical models
Seamless link to 3D device simulators including structure mirroring, adaptive doping refinement and electrode specification
Silvaco\’s strong encryption is available to protect valuable customer and third party intellectual property.
Core Process Simulator
VICTORY Process Core Simulator provides a convenient platform for fast simulation of all important process steps in 3D.
Fast Geometrical Etch and Deposition
Idealized isotropic etching
Idealized conformal deposition
Selective etching or complete removal of material regions
Idealized full structure or selective material planarization
Mask pattern with tilted sidewalls or rounded corners
Mask pattern transfer by vertical or dry etching
Mask pattern transfer of aerial images
Mask polygon definition within the input deck
Supports mask feature variations (shrink and expand)
Supports GDSII and MaskViews mask formats
Product:Silvaco TCAD 2012
Lanaguage:english
Platform:Linux
Size:2DVD